Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

Nanoscale Research Letters

Volumn 5, Issue 11, 2010, Pages 1721-1726

  Li, Xiaocheng ^a   Li, Junshuai ^a   Chen, Ting ^a   Tay, Beng Kang ^a   Wang, Jianxiong ^a   Yu, Hongyu ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Antireflection; Chemical etching; Periodicity; Si nanopillar arrays; Solar cell

Indexed keywords

ANTI-REFLECTION; ANTIREFLECTION LAYERS; CHEMICAL ETCHING; CHEMICAL-ETCHING PROCESS; INCIDENT LIGHT; NANOPILLAR; PERIODICITY; POLYSTYRENE SPHERES; POWER CONVERSION EFFICIENCIES; REFLECTION LOSS; SI NANO-PILLAR ARRAY; SI NANOSTRUCTURES; SI SUBSTRATES; SOLAR-CELL APPLICATIONS; SUB-WAVELENGTH STRUCTURES; SURFACE PASSIVATION; WAVELENGTH RANGES;

CONVERSION EFFICIENCY; ETCHING; LIGHT REFLECTION; PASSIVATION; POLYSTYRENES; SOLAR CELLS;

SILICON;

EID: 78049430521     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1007/s11671-010-9701-3     Document Type: Article

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