Narrow-band waveguide Bragg gratings on SOI wafers with CMOS-compatible fabrication process

Optics Express

Volumn 20, Issue 14, 2012, Pages 15547-15558

  Wang, Xu ^a   Shi, Wei ^a   Yun, Han ^a   Grist, Samantha ^a   Jaeger, Nicolas A F ^a   Chrostowski, Lukas ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; BRAGG GRATINGS; RIDGE WAVEGUIDES; SILICON WAFERS; WAVEGUIDES;

BRAGG WAVELENGTH; CMOS COMPATIBLE; COUPLING COEFFICIENT; DEEP ULTRAVIOLET LITHOGRAPHY; FABRICATION PROCESS; FABRICATION TOLERANCES; GRATING DEVICES; NARROW BANDS; NARROW BANDWIDTH; NONUNIFORMITY; ON-CHIP APPLICATIONS; PRECISE CONTROL; SILICON ON INSULATOR; SINGLE MODE; SOI WAFERS; SPECTRAL MEASUREMENT; WAFER THICKNESS; WAVEGUIDE BRAGG GRATING; WDM CHANNELS;

FABRICATION;

EID: 84863749251     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.015547     Document Type: Article

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