Deep-UV technology for the fabrication of bragg gratings on SOI Rib waveguides

IEEE Photonics Technology Letters

Volumn 21, Issue 24, 2009, Pages 1894-1896

  Giuntoni, Ivano ^a   Stolarek, David ^b   Richter, Harald ^b   Marschmeyer, Steffen ^b   Bauer, Joachim ^b   Gajda, Andrzej ^a   Bruns, Jürgen ^a   Tillack, Bernd ^b   Petermann, Klaus ^a   Zimmermann, Lars ^a,b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b IHP   (Germany)

Author keywords

Bragg scattering; Gratings; Rib waveguides; Silicon on insulator technology; Waveguide filters

Indexed keywords

BRAGG SCATTERING; DEEP-UV; DEVICE PERFORMANCE; PATTERNING TECHNIQUES; PROCESS VARIATION; RIB WAVEGUIDES; SILICON ON INSULATOR; TECHNOLOGY-BASED; ULTRAVIOLET LITHOGRAPHY; WAFER LEVEL; WAVEGUIDE FILTER;

BRAGG GRATINGS; CIRCULAR WAVEGUIDES; ELECTROMAGNETIC WAVE SCATTERING; LITHOGRAPHY; SILICON WAFERS; TECHNOLOGY; WAVEGUIDE COMPONENTS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 77955181225     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2009.2035096     Document Type: Article

References (10)

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