Tunable Bragg reflectors on silicon-on-insulator rib waveguides

Optics Express

Volumn 17, Issue 21, 2009, Pages 18518-18524

  Giuntoni, Ivano ^a   Gajda, Andrzej ^a   Krause, Michael ^b   Steingruber, Ralf ^c   Bruns, Jürgen ^a   Petermann, Klaus ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

^c FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG REFLECTORS; ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY; REFLECTION; WAVEGUIDES;

ETCHING DEPTH; FABRICATION AND CHARACTERIZATIONS; LITHOGRAPHIC PROCESS; LOW-LOSS; RIB WAVEGUIDES; TUNABILITIES; WAVEGUIDE GEOMETRY;

SILICON ON INSULATOR TECHNOLOGY;

EID: 70350338532     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.018518     Document Type: Article

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