Preparation and microstructural studies of electrodeposited Cu 2O thin films

Materials Letters

Volumn 58, Issue 11, 2004, Pages 1802-1807

  Mahalingam, T ^a   Chitra, J S P ^a   Chu, J P ^b   Sebastian, P J ^c  

^a ALAGAPPA UNIVERSITY   (India)

^b NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^c INSTITUTO DE ENERGÍAS RENOVABLES   (Mexico)

Author keywords

Annealing studies; Crystal structure; Cuprous oxide thin films; Electrical properties; Microstructural parameters; Potentiostatic deposition

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; ELECTRODEPOSITION; OPTIMIZATION; OXIDATION; PH EFFECTS; PHOTOVOLTAIC CELLS; SCANNING ELECTRON MICROSCOPY; STACKING FAULTS; THIN FILMS; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ANNEALING STUDIES; CUPROUS OXIDE THIN FILMS; MICROSTRUCTURAL PARAMETERS; POTENTIOSTATIC DEPOSITION;

COPPER OXIDES;

EID: 1542272676     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2003.10.055     Document Type: Article

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