Cu2O thin films deposited by reactive direct current magnetron sputtering

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5700-5704

  Zhu, Hailing ^a   Zhang, Junying ^a   Li, Chunzhi ^a   Pan, Feng ^a   Wang, Tianmin ^a   Huang, Baibiao ^b  

^a BEIHANG UNIVERSITY   (China)

^b SHANDONG UNIVERSITY   (China)

Author keywords

Cuprous oxide; Oxygen; Photocatalysis; Reactive DC magnetron sputtering; Thin films; X ray diffraction

Indexed keywords

CUPROUS OXIDE; DIRECT CURRENT MAGNETRON SPUTTERING; GAS FLOWRATE; OXYGEN PARTIAL PRESSURE; PHOTOCATALYTIC ACTIVITIES; PROPERTIES OF DEPOSITED FILMS; QUARTZ SUBSTRATE; REACTIVE DC MAGNETRON SPUTTERING; VISIBLE LIGHT; VISIBLE REGION;

AERODYNAMICS; COPPER OXIDES; DIFFRACTION; FLOW OF GASES; FLOW RATE; GAS ABSORPTION; LIGHT; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE MINERALS; OXYGEN; PARTIAL PRESSURE; PHOTOCATALYSIS; POSITIVE IONS; QUARTZ; THIN FILMS; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 66049085993     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.127     Document Type: Article

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