Synthesis of highly transparent ultrananocrystalline diamond films from a low-pressure, low-temperature focused microwave plasma jet

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages 1-8

  Liao, Wen Hsiang ^a   Wei, Da Hua ^a   Lin, Chii Ruey ^a  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Focused microwave plasma jet; Low pressure low temperature synthesis; Transmittance; Ultrananocrystalline diamond films

Indexed keywords

CARBON CONTENT; CARBON PHASE; FOCUSED MICROWAVES; GAS CHEMISTRY; GLASS SUBSTRATES; GRAIN SIZE; LOW TEMPERATURES; LOW-TEMPERATURE PROCESS; MEAN FREE PATH; MICROWAVE PLASMA; MICROWAVE PLASMA JET; NANOCRYSTALLINES; SLUGGISH KINETICS; SUBSTRATE TEMPERATURE; TRANSMITTANCE; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMOND FILMS; UNHEATED SUBSTRATES;

CARBON; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; GROWTH KINETICS; MICROWAVES; SUBSTRATES; SURFACE ROUGHNESS; SYNTHETIC DIAMONDS; TEMPERATURE;

PLASMA JETS;

EID: 84863285124     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-82     Document Type: Article

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