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Volumn 114, Issue 35, 2010, Pages 14843-14848

Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements

Author keywords

[No Author keywords available]

Indexed keywords

BAND DIAGRAMS; CONFORMAL FILLING; CONTINUOUS FLOWS; CONTINUOUS-FLOW PROCESS; CYCLE TIME; DEFECT-FREE; DEPOSITION KINETICS; DEPOSITION PROCESS; DEPTH PROFILE; FILLING KINETICS; FLOW PROCESS; HIGH ASPECT RATIO; KNUDSEN FLOW; OPAL PHOTONIC CRYSTALS; OPAL TEMPLATE; PHOTONIC BAND GAP PROPERTIES; PHOTONIC BANDS; PRECURSOR GAS; QUANTITATIVE INVESTIGATION; SAMPLE PREPARATION TECHNIQUES; SELF-ASSEMBLED; STEP COVERAGE; TIO; TRANSMITTANCE SPECTRA;

EID: 78650806878     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1053748     Document Type: Article
Times cited : (41)

References (31)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.