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Volumn 158, Issue 5, 2011, Pages

Ozone based atomic layer deposition of hafnium oxide and impact of nitrogen oxide species

(10) Delabie, Annelies a Swerts, Johan a Elshocht, Sven Van a Jung, Sung Hoon b Raisanen, Petri I b Givens, Michael E b Shero, Eric J b Peeters, Jozef c MacHkaoutsan, Vladimir d Maes, Jan Willem d

a IMEC (Belgium)

b ASM (United States)

c UNIVERSITY OF LEUVEN (Belgium)

d ASM (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS-FLOW REACTORS; DIELECTRIC BARRIER DISCHARGES; DIELECTRIC LAYER; GAS FLOWS; GROWTH PER CYCLE; HIGH QUALITY; HIGHER TEMPERATURES; HOT WALL; IMPURITY CONTENT; METAL OXIDES; METAL PRECURSOR; NITROGEN OXIDE SPECIES; REACTOR WALLS; SI SUBSTRATES; TEMPERATURE RANGE;

ATOMIC LAYER DEPOSITION; DIELECTRIC DEVICES; GAS PERMEABLE MEMBRANES; HAFNIUM; HAFNIUM OXIDES; NITRIC OXIDE; NITROGEN; NITROGEN OXIDES; OZONE; PLATINUM;

OZONE LAYER;

EID: 79953232045 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3561423 Document Type: Article

Times cited : (18)

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