Argon 420.1-419.8nm emission line ratio for measuring plasma effective electron temperatures

Journal of Physics D: Applied Physics

Volumn 45, Issue 4, 2012, Pages

  Boffard, John B ^a   Jung, R O ^a,b   Lin, Chun C ^a   Aneskavich, L E ^a   Wendt, A E ^a  

^a University of Wisconsin Madison   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS SECTION; ELECTRON EXCITATIONS; EMISSION LINES; EXPERIMENTAL MEASUREMENTS; LOW ELECTRON TEMPERATURE; METASTABLE LEVELS; OPTICAL EMISSIONS; PLASMA CONDITIONS;

ELECTROMAGNETIC WAVE EMISSION; ELECTRONS; EXCITED STATES; INDUCTIVELY COUPLED PLASMA;

ELECTRON TEMPERATURE;

EID: 84862966751     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/4/045201     Document Type: Article

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