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Volumn 100, Issue 2, 2012, Pages

Intrinsic parameter extraction of a-InGaZnO thin-film transistors by a gated-four-probe method

Author keywords

[No Author keywords available]

Indexed keywords

BACK CHANNELS; ELECTRICAL CHARACTERISTIC; FIELD-EFFECT MOBILITIES; NONUNIFORMITY; PARASITIC RESISTANCES; SEPARATE ANALYSIS;

EID: 84862909074     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3675876     Document Type: Article
Times cited : (22)

References (14)
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    • Park, J.-S.1    Jeong, J.K.2    Mo, Y.-G.3    Kim, H.D.4    Kim, S.-I.5
  • 5
    • 17944365907 scopus 로고    scopus 로고
    • Potential mapping of pentacene thin-film transistors using purely electric atomic-force-microscope potentiometry
    • DOI 10.1063/1.1891306, 122112
    • M. Nakamura, N. Goto, N. Ohashi, M. Sakai, and K. Kudo, Appl. Phys. Lett. 86, 122112 (2005). 10.1063/1.1891306 (Pubitemid 40596913)
    • (2005) Applied Physics Letters , vol.86 , Issue.12 , pp. 1-3
    • Nakamura, M.1    Goto, N.2    Ohashi, N.3    Sakai, M.4    Kudo, K.5
  • 6
    • 11044237704 scopus 로고    scopus 로고
    • Gated four-probe measurements on pentacene thin-film transistors: Contact resistance as a function of gate voltage and temperature
    • DOI 10.1063/1.1806533, 13
    • P. V. Pesavento, R. J. Chesterfield, C. R. Newman, and C. D. Frisbie, J. Appl. Phys. 96, 7312 (2004). 10.1063/1.1806533 (Pubitemid 40044418)
    • (2004) Journal of Applied Physics , vol.96 , Issue.12 , pp. 7312-7324
    • Pesavento, P.V.1    Chesterfield, R.J.2    Newman, C.R.3    Frisble, C.D.4
  • 7
    • 0141764631 scopus 로고    scopus 로고
    • Investigation of intrinsic channel characteristics of hydrogenated amorphous silicon thin-film transistors by gated-four-probe structure
    • DOI 10.1063/1.121484, PII S0003695198046221
    • C. Chiang, C. Chen, J. Kanicki, and K. Takechi, Appl. Phys. Lett. 72, 2874 (1998). 10.1063/1.121484 (Pubitemid 128671627)
    • (1998) Applied Physics Letters , vol.72 , Issue.22 , pp. 2874-2876
    • Chiang, C.-S.1    Chen, C.-Y.2    Kanicki, J.3    Takechi, K.4
  • 9
    • 0021427789 scopus 로고
    • Physics of amorphous silicon based alloy field-effect transistors
    • DOI 10.1063/1.332893
    • M. Shur and M. Hack, J. Appl. Phys. 55, 3831 (1984). 10.1063/1.332893 (Pubitemid 14607731)
    • (1984) Journal of Applied Physics , vol.55 , Issue.10 , pp. 3831-3842
    • Shur, M.1    Hack, M.2
  • 14
    • 84862919312 scopus 로고    scopus 로고
    • Scaling behavior of a-IGZO TFTs with transparent a-IZO source/drain electrodes (unpublished).
    • J. Jeong, G. J. Lee, J. Kim, and B. D. Choi, Scaling behavior of a-IGZO TFTs with transparent a-IZO source/drain electrodes (unpublished).
    • Jeong, J.1    Lee, G.J.2    Kim, J.3    Choi, B.D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.