Directly addressable sub-3 nm gold nanogaps fabricated by nanoskiving using self-assembled monolayers as templates

ACS Nano

Volumn 6, Issue 6, 2012, Pages 5566-5573

  Pourhossein, Parisa ^a   Chiechi, Ryan C ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

molecular electronics; nanofabrication; nanogaps; nanoskiving; self assembled monolayers

Indexed keywords

CARBON ATOMS; CURRENT-VOLTAGE PLOTS; EDGE LITHOGRAPHY; HIGH ASPECT RATIO; LITHOGRAPHIC PROCESS; NANO-GAP; NANOGAPS; NANOSKIVING; ORGANIC COMPONENTS; OXYGEN PLASMAS; SQUARE CROSS SECTION;

ASPECT RATIO; FABRICATION; MOLECULAR ELECTRONICS; NANOTECHNOLOGY; NANOWIRES; SELF ASSEMBLED MONOLAYERS; SEPARATION; TRANSMISSION ELECTRON MICROSCOPY;

GOLD;

GOLD; NANOPARTICLE;

ARTICLE; CHEMISTRY; CONFORMATION; ELECTRIC CONDUCTIVITY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MICROELECTRODE; MOLECULAR IMPRINTING; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ELECTRIC CONDUCTIVITY; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GOLD; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MICROELECTRODES; MOLECULAR CONFORMATION; MOLECULAR IMPRINTING; NANOPARTICLES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 84862883356     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn301510x     Document Type: Article

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