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Journal of Materials Chemistry

Volumn 22, Issue 25, 2012, Pages 12682-12688

Nanocrystalline diamond AFM tips for chemical force spectroscopy: Fabrication and photochemical functionalization

(5) Drew, Michael E a Konicek, Andrew R a Jaroenapibal, Papot a Carpick, Robert W b Yamakoshi, Yoko a,c,d

a UNIVERSITY OF PENNSYLVANIA (United States)

b UNIVERSITY OF PENNSYLVANIA (United States)

c ETH ZURICH (Switzerland)

d JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION MEASUREMENT; AFM; AFM TIP; ATOMIC FORCE MICROSCOPE (AFM); ATR FTIR; CHEMICAL FORCES; CHEMICAL FUNCTIONALITY; CHEMICAL FUNCTIONALIZATION; DETECTION OF CHEMICALS; FUNCTIONAL MOIETIES; FUNCTIONALIZATIONS; NANOCRYSTALLINE DIAMONDS; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE; ON-WAFER; UNDECYLENIC ACID; WATER CONTACT ANGLE;

ADHESION; ATOMIC FORCE MICROSCOPY; CARBOXYLIC ACIDS; CHEMICAL DETECTION; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; NANOPROBES; PHOTOCHEMICAL REACTIONS; PHOTOELECTRONS; SILICON WAFERS; WAFER BONDING; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL MODIFICATION;

EID: 84862201037 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm16209a Document Type: Article

Times cited : (21)

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