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Journal of Applied Physics

Volumn 111, Issue 7, 2012, Pages

Atmospheric pressure dielectric barrier microplasmas inside hollow-core optical fibers

(4) Ji, Longfei a,b Liu, Dongping a,b Song, Ying a,c Niu, Jinhai a

a DALIAN NATIONALITIES UNIVERSITY (China)

b CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

c DALIAN UNIVERSITY OF TECHNOLOGY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON-CONTAINING SPECIES; COATING CHARACTERIZATIONS; CURRENT PULSE; DIELECTRIC BARRIER; DISCHARGE MECHANISMS; FLUOROCARBON POLYMERS; HOLLOW CORES; HOLLOW FIBER; HOLLOW OPTICAL FIBERS; HOLLOW-CORE; IN-SITU; INNER SURFACES; MICRO-PLASMAS; MICRODISCHARGES; OPTICAL EMISSIONS; PEAK VOLTAGE; PULSEWIDTHS; SINUSOIDAL VOLTAGE; SURFACE BARRIER DISCHARGE; UNIFORM DEPOSITION;

ATMOSPHERIC PRESSURE; COATINGS; FIBER OPTIC COMPONENTS; HELIUM; LIGHT EMISSION; METAMATERIALS; MICROELECTRODES; PLASMA DEVICES;

OPTICAL FIBERS;

EID: 84861730614 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3702818 Document Type: Conference Paper

Times cited : (16)

References (31)

1
- 77951167409
- 10.1063/1.3380811
- R. Bussiahn, R. Brandenburg, T. Gerling, E. Kindel, H. Lange, N. Lembke, K. D. Weltmann, T. V. Woedtke, and T. Kocher, Appl. Phys. Lett. 96, 143701 (2010). 10.1063/1.3380811
- (2010) Appl. Phys. Lett. , vol.96 , pp. 143701
- Bussiahn, R.¹ Brandenburg, R.² Gerling, T.³ Kindel, E.⁴ Lange, H.⁵ Lembke, N.⁶ Weltmann, K.D.⁷ Woedtke, T.V.⁸ Kocher, T.⁹

2
- 77954665291
- 10.1002/smll.201000480
- J. Y. Kim, J. Ballato, P. Foy, T. Hawkins, Y. Wei, J. Li, and S. Kim, Small 6, 1474 (2010). 10.1002/smll.201000480
- (2010) Small , vol.6 , pp. 1474
- Kim, J.Y.¹ Ballato, J.² Foy, P.³ Hawkins, T.⁴ Wei, Y.⁵ Li, J.⁶ Kim, S.⁷

3
- 80051717739
- 10.1002/smll.201100456
- J. Y. Kim, Y. Wei, J. Li, P. Foy, T. Hawkins, J. Ballato, and S. Kim, Small 7, 2291 (2011). 10.1002/smll.201100456
- (2011) Small , vol.7 , pp. 2291
- Kim, J.Y.¹ Wei, Y.² Li, J.³ Foy, P.⁴ Hawkins, T.⁵ Ballato, J.⁶ Kim, S.⁷

4
- 84855557774
- 10.1002/ppa201000163
- M. Polak, J. Winter, U. Schnabel, J. Ehlbeck, and K. D. Weltman, Plasma Processes Polym. 9, 67 (2012). 10.1002/ppap.201000163
- (2012) Plasma Processes Polym. , vol.9 , pp. 67
- Polak, M.¹ Winter, J.² Schnabel, U.³ Ehlbeck, J.⁴ Weltman, K.D.⁵

5
- 72449155689
- E. Robert, E. Barbosa, S. Dozias, M. Vandamme, C. Cachoncinlle, R. Viladrosa, and J. M. Pouvesle, Plasma Processes Polym. 6, 795 (2009).
- (2009) Plasma Processes Polym. , vol.6 , pp. 795
- Robert, E.¹ Barbosa, E.² Dozias, S.³ Vandamme, M.⁴ Cachoncinlle, C.⁵ Viladrosa, R.⁶ Pouvesle, J.M.⁷

6
- 0037698976
- 10.1038/nature01275
- B. Temelkuran, S. D. Hart, G. Benolt, J. D. Joannopoulos, and Y. Fink, Nature 420, 650 (2002). 10.1038/nature01275
- (2002) Nature , vol.420 , pp. 650
- Temelkuran, B.¹ Hart, S.D.² Benolt, G.³ Joannopoulos, J.D.⁴ Fink, Y.⁵

7
- 0036507969
- 10.1364/AO.41.001251
- S. Mohri, T. Kasai, Y. Abe, Y. Shi, Y. Matsuura, and M. Miyagi, Appl. Opt. 41, 1251 (2002). 10.1364/AO.41.001251
- (2002) Appl. Opt. , vol.41 , pp. 1251
- Mohri, S.¹ Kasai, T.² Abe, Y.³ Shi, Y.⁴ Matsuura, Y.⁵ Miyagi, M.⁶

8
- 0029483830
- 10.1016/0030-3992(95)00041-0
- M. Osawa, Y. Kato, T. Watanabe, M. Miyagi, S. Abe, M. Aizawa, and S. Onodera, Opt. Laser Technol. 27, 393 (1995). 10.1016/0030-3992(95)00041-0
- (1995) Opt. Laser Technol. , vol.27 , pp. 393
- Osawa, M.¹ Kato, Y.² Watanabe, T.³ Miyagi, M.⁴ Abe, S.⁵ Aizawa, M.⁶ Onodera, S.⁷

9
- 0033717297
- 10.1117/12.384912
- Y. Shi, Y. Abe, S. Mori, Y. Matsuura, and M. Miyagi, Proc. SPIE 3911, 268 (2000). 10.1117/12.384912
- (2000) Proc. SPIE , vol.3911 , pp. 268
- Shi, Y.¹ Abe, Y.² Mori, S.³ Matsuura, Y.⁴ Miyagi, M.⁵

10
- 40149110726
- 10.1364/OL.32.003420
- K. Iwai, M. Miyagi, Y. Shi, X. Zhu, and Y. Matsuura, Opt. Lett. 32, 3420 (2007). 10.1364/OL.32.003420
- (2007) Opt. Lett. , vol.32 , pp. 3420
- Iwai, K.¹ Miyagi, M.² Shi, Y.³ Zhu, X.⁴ Matsuura, Y.⁵

11
- 0025474980
- 10.1088/0022-3727/23/8/021
- T. Yokoyama, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D: Appl. Phys. 23, 1125 (1990). 10.1088/0022-3727/23/8/021
- (1990) J. Phys. D: Appl. Phys. , vol.23 , pp. 1125
- Yokoyama, T.¹ Kogoma, M.² Moriwaki, T.³ Okazaki, S.⁴

12
- 79953735846
- 10.1063/1.3574017
- D. Dai, H. X. Hou, and Y. P. Hao, Appl. Phys. Lett. 98, 131503 (2011). 10.1063/1.3574017
- (2011) Appl. Phys. Lett. , vol.98 , pp. 131503
- Dai, D.¹ Hou, H.X.² Hao, Y.P.³

13
- 33750600944
- 10.1088/0963-0252/15/4/006
- A. Sublet, C. Ding, J.-L. Dorier, Ch. Hollenstein, P. Fayet, and F. Coursimault, Plasma Sources Sci. Technol. 15, 627 (2006). 10.1088/0963-0252/15/ 4/006
- (2006) Plasma Sources Sci. Technol. , vol.15 , pp. 627
- Sublet, A.¹ Ding, C.² Dorier, J.-L.³ Hollenstein, Ch.⁴ Fayet, P.⁵ Coursimault, F.⁶

14
- 33745622460
- 10.1088/0963-0252/15/3/017
- J. H. Choi, T. I. Lee, I. Han, H. K. Baik, K. M. Song, Y. S. Lim, and E. S. Lee, Plasma Sources Sci. Technol. 15, 416 (2006). 10.1088/0963-0252/15/3/017
- (2006) Plasma Sources Sci. Technol. , vol.15 , pp. 416
- Choi, J.H.¹ Lee, T.I.² Han, I.³ Baik, H.K.⁴ Song, K.M.⁵ Lim, Y.S.⁶ Lee, E.S.⁷

15
- 0026138740
- 10.1088/0022-3727/24/4/007
- D. Braun, U. Kchler, and G. Pietsch, J. Phys. D: Appl. Phys. 24, 564 (1991). 10.1088/0022-3727/24/4/007
- (1991) J. Phys. D: Appl. Phys. , vol.24 , pp. 564
- Braun, D.¹ Kchler, U.² Pietsch, G.³

16
- 70450218711
- 10.1002/ppa200950012
- F. Fanelli, Plasma Processes Polym. 6, 547 (2009). 10.1002/ppap.200950012
- (2009) Plasma Processes Polym. , vol.6 , pp. 547
- Fanelli, F.¹

17
- 70350128466
- 10.1109/TPS.2009.2023849
- T. V. Rakhimova, O. V. Braginsky, K. S. Klopovskiy, A. S. Kovalev, D. V. Lopaev, O. V. Proshina, A. T. Rakhimov, D. Shamiryan, A. N. Vasilieva, D. G. Voloshin, O. V. Proshina, A. T. Rakhimov, D. Shamiryan, A. N. Vasilieva, and D. G. Voloshin, IEEE Trans. Plasma Sci. 37, 1683 (2009). 10.1109/TPS.2009.2023849
- (2009) IEEE Trans. Plasma Sci. , vol.37 , pp. 1683
- Rakhimova, T.V.¹ Braginsky, O.V.² Klopovskiy, K.S.³ Kovalev, A.S.⁴ Lopaev, D.V.⁵ Proshina, O.V.⁶ Rakhimov, A.T.⁷ Shamiryan, D.⁸ Vasilieva, A.N.⁹ Voloshin, D.G.¹⁰ Proshina, O.V.¹¹ Rakhimov, A.T.¹² Shamiryan, D.¹³ Vasilieva, A.N.¹⁴ Voloshin, D.G.¹⁵

18
- 54149094326
- 10.1002/ppa200800012
- F. Fanelli, F. Fracassi, and R. d'Agostino, Plasma Processes Polym. 5, 424 (2008). 10.1002/ppap.200800012
- (2008) Plasma Processes Polym. , vol.5 , pp. 424
- Fanelli, F.¹ Fracassi, F.² D'Agostino, R.³

19
- 33749317318
- 10.1063/1.2338282
- J. H. Kim, Y. H. Choi, and Y. S. Hwang, Phys. Plasmas 13, 93501 (2006). 10.1063/1.2338282
- (2006) Phys. Plasmas , vol.13 , pp. 93501
- Kim, J.H.¹ Choi, Y.H.² Hwang, Y.S.³

20
- 33847728665
- 10.1063/1.2426975
- T. Sakamoto, H. Matsuura, and H. Akatsuka, J. Appl. Phys. 101, 23307 (2007). 10.1063/1.2426975
- (2007) J. Appl. Phys. , vol.101 , pp. 23307
- Sakamoto, T.¹ Matsuura, H.² Akatsuka, H.³

21
- 67650318732
- 10.1109/TPS.2009.2017539
- T. Yuji, S. Fujii, N. Mungkung, and H. Akatsuka, IEEE Trans. Plasma Sci. 37, 839 (2009). 10.1109/TPS.2009.2017539
- (2009) IEEE Trans. Plasma Sci. , vol.37 , pp. 839
- Yuji, T.¹ Fujii, S.² Mungkung, N.³ Akatsuka, H.⁴

22
- 0001536204
- 10.1063/1.361439
- K. J. Clay, S. P. Speakman, G. A. J. Amaratunga, and S. R. P. Silva, J. Appl. Phys. 79, 7227 (1996). 10.1063/1.361439
- (1996) J. Appl. Phys. , vol.79 , pp. 7227
- Clay, K.J.¹ Speakman, S.P.² Amaratunga, G.A.J.³ Silva, S.R.P.⁴

23
- 0347118942
- 10.1063/1.462159
- Z. Li and J. S. Francisco, J. Chem. Phys. 96, 878 (1992). 10.1063/1.462159
- (1992) J. Chem. Phys. , vol.96 , pp. 878
- Li, Z.¹ Francisco, J.S.²

24
- 52349092422
- 10.1063/1.2982497
- J. L. Walsh and M. G. Kong, Appl. Phys. Lett. 93, 111501 (2008). 10.1063/1.2982497
- (2008) Appl. Phys. Lett. , vol.93 , pp. 111501
- Walsh, J.L.¹ Kong, M.G.²

25
- 11144250529
- 10.1002/ppa200400021
- A. Milella, F. Palumbo, P. Favia, G. Cicala, and R. d'Agostino, Plasma Processes Polym. 1, 164 (2004). 10.1002/ppap.200400021
- (2004) Plasma Processes Polym. , vol.1 , pp. 164
- Milella, A.¹ Palumbo, F.² Favia, P.³ Cicala, G.⁴ D'Agostino, R.⁵

26
- 78249244428
- 10.1088/0022-3727/43/38/382001
- Q. Li, W. Zhu, X. Zhu, and Y. Pu, J. Phys. D: Appl. Phys. 430, 382001 (2010). 10.1088/0022-3727/43/38/382001
- (2010) J. Phys. D: Appl. Phys. , vol.430 , pp. 382001
- Li, Q.¹ Zhu, W.² Zhu, X.³ Pu, Y.⁴

27
- 70350648238
- 10.1088/0022-3727/42/20/202002
- W. Zhu, Q. Li, X. Zhu, and Y. Pu, J. Phys. D: Appl. Phys. 42, 202002 (2009). 10.1088/0022-3727/42/20/202002
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 202002
- Zhu, W.¹ Li, Q.² Zhu, X.³ Pu, Y.⁴

28
- 0037422652
- 10.1088/0022-3727/36/1/306
- Yu. B. Golubovskii, V. A. Maiorov, J. Behnke, and J. F. Behnke, J. Phys. D: Appl. Phys. 36, 39 (2003). 10.1088/0022-3727/36/1/306
- (2003) J. Phys. D: Appl. Phys. , vol.36 , pp. 39
- Golubovskii, Yu.B.¹ Maiorov, V.A.² Behnke, J.³ Behnke, J.F.⁴

29
- 33750584605
- 10.1088/0963-0252/15/4/031
- G. Borcia, A. Chiper, and I. Rusu, Plasma Sources Sci. Technol. 15, 949 (2006). 10.1088/0963-0252/15/4/031
- (2006) Plasma Sources Sci. Technol. , vol.15 , pp. 949
- Borcia, G.¹ Chiper, A.² Rusu, I.³

30
- 33749043458
- 10.1016/j.cplett.2006.08.123
- D. Liu, I. T. Martin, and E. R. Fisher, Chem. Phys. Lett. 430, 113 (2006). 10.1016/j.cplett.2006.08.123
- (2006) Chem. Phys. Lett. , vol.430 , pp. 113
- Liu, D.¹ Martin, I.T.² Fisher, E.R.³

31
- 34248589908
- 10.1116/1.2699216
- D. Liu and E. R. Fisher, J. Vac. Sci. Technol. A 25, 368 (2007). 10.1116/1.2699216
- (2007) J. Vac. Sci. Technol. A , vol.25 , pp. 368
- Liu, D.¹ Fisher, E.R.²

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