Experimental study of a compact nanosecond plasma gun

Plasma Processes and Polymers

Volumn 6, Issue 12, 2009, Pages 795-802

  Robert, Eric ^a   Barbosa, Emerson ^a   Dozias, Sébastien ^a   Vandamme, Marc ^a   Cachoncinlle, Christophe ^a   Viladrosa, Raymond ^a   Pouvesle, Jean Michel ^a  

^a CREMI   (France)

Author keywords

Nanosecond imaging; Non thermal plasma; Plasma medicine; Pulsed discharges

Indexed keywords

AIR PLASMAS; AMBIENT AIR; DIELECTRIC CAPILLARY; DISCHARGE PLASMA; EXPERIMENTAL STUDIES; HELIUM FLOW RATE; HIGH VELOCITY; HIGH VOLTAGE; HIGH VOLTAGE POWER; ICCD IMAGING; INNER SURFACES; MEDICINE APPLICATION; NANOSECOND DURATION; NANOSECOND IMAGING; NON-THERMAL PLASMA; NONTHERMAL; PLASMA BULLETS; PLASMA PLUMES; PULSED DIELECTRIC BARRIER DISCHARGES; PULSED DISCHARGE; SMALL-DIAMETER; SPECTROSCOPIC MEASUREMENTS; TIME-RESOLVED;

DIELECTRIC DEVICES; ELECTRIC DISCHARGES; ELECTRIC REACTORS; HELIUM; NEON; PLASMA DIAGNOSTICS; PLASMA GUNS; PROJECTILES; THERMAL PLUMES;

PLASMAS;

EID: 72449155689     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900078     Document Type: Article

References (13)

1. Special Issue, Plasma Process Polym. 2006, 3, 383.
2. G. Rotondano, M. A. Bianco, R. Marmo, R. Piscopo, L. Cipolletta, Dig. Liver Dis. 2003, 35, 806.
3. K. R. Stalder, J. Woloszko, I. G. Brown, C. D. Smith, Appl Phys. Lett. 2001, 79, 4503.
4. F. Clément, E. Panousis, B. Held, J.-F. Loiseau, A. Ricard, J.-P. Sarrette, J. Phys. D: Appl. Phys. 2008, 41, 085206.
5. E. Stoffels, A. J. Flikweert, W. W. Stoffels, G. M. W. Kroesen, Plasma Sources Sci. Technol. 2002, 11, 383.
6. I. E. Kieft, E. P. van der Laan, E. Stoffels, New ;. Phys. 2004, 6, 1149.
7. M. Laroussi, X. P. Lu, Appl. Phys. Lett. 2005, 87, 113902.
8. G. Fridman, M. Peddinghaus, H. Ayan, A. Fridman, M. Balasubramanian, A. Gutsol, A. Brooks, G. Friedman, Plasma Chem. Plasma Process. 2006, 26, 425.
9. G. Fridman, A. Shereshevsky, M. M. Jost, A. D. Brooks, A. Fridman, A. Gutsol, V. Vasilets, G. Friedman, Plasma Chem. Plasma Process. 2007, 27, 163.
10. J. Shi, F. Zhong, J. Zhang, D. W. Liu, M. G. Kong, Phys. Plasmas 2008, 15, 013504.
11. N. Mericam-Bourdet, M. Laroussi, A. Begum, E. Karakas, J. Phys. D: Appl. Phys. 2009, 42, 055207.
12. FR. WO2009050240 (2009), Centre National de la Recherche Scientifique (FR) and Université d'Orléans (FR), inventors: J. M. Pouvesle, C. Cachoncinlle, R. Viladrosa, A. Khacef, E. Robert, S. Dozias.
13. J. Kedzierski, J. Engemann, M. Teschke, D. Korzec, Solid State Phenom. 2005, 107, 119.