Effects of air annealing on the structure, resistivity, infrared emissivity and transmission of indium tin oxide films

Surface and Coatings Technology

Volumn 206, Issue 19-20, 2012, Pages 4095-4098

  Sun, Kewei ^a   Zhou, Wancheng ^a   Tang, Xiufeng ^a   Huang, Zhibin ^a   Luo, Fa ^a   Zhu, Dongmei ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Air annealing; Direct current magnetron sputtering; Indium tin oxide films; Infrared emissivity; Transmission

Indexed keywords

AIR-ANNEALING; AMORPHOUS STATE; ANNEALING TEMPERATURES; BIXBYITE; CRYSTALLINE PHASE; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRICAL RESISTIVITY; FOUR-POINT PROBE; GLASS SUBSTRATES; INDIUM TIN OXIDE FILMS; INFRARED EMISSIVITY; ITO FILMS; MEASUREMENT INSTRUMENTS; POLYCRYSTALLINE; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPE;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ANNEALING; ELECTRIC CONDUCTIVITY; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TIN; TIN OXIDES; TRANSMISSIONS; X RAY POWDER DIFFRACTION;

ELECTROMAGNETIC WAVE EMISSION;

EID: 84861458530     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.04.001     Document Type: Article

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