Thermal degradation behavior of indium tin oxide thin films deposited by radio frequency magnetron sputtering

Journal of Materials Research

Volumn 20, Issue 6, 2005, Pages 1574-1579

  Kim, Yong Nam ^a   Shin, Hyun Gyoo ^a   Song, Jun Kwang ^a   Cho, Dae Hyoung ^a   Lee, Hee Soo ^a   Jung, Yeon Gil ^b  

^a Korea Testing Laboratory   (South Korea)

^b Changwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMISORPTION; DIFFUSION; GRAIN BOUNDARIES; HALL EFFECT; MAGNETRON SPUTTERING; PYROLYSIS; SATURATION (MATERIALS COMPOSITION); SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HALL MOBILITY; INDIUM TIN OXIDE; RADIO FREQUENCY MAGNETRON SPUTTERING;

INDIUM COMPOUNDS;

EID: 29044438093     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0199     Document Type: Article

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