Structure and morphology optimization of poly(3-hexylthiophene) thin films onto silanized silicon oxide

European Polymer Journal

Volumn 48, Issue 6, 2012, Pages 1050-1061

  Scavia, G ^a   Barba, L ^b   Arrighetti, G ^b   Milita, S ^a   Porzio, W ^a  

^a CNR   (Italy)

^b CNR   (Italy)

Author keywords

Atomic force microscopy; Polymer science; Structure and orientation; Surface interactions; Synchrotron radiation

Indexed keywords

GRAZING INCIDENCE X-RAY DIFFRACTION; OPTIMAL CONDITIONS; POLY (3-HEXYLTHIOPHENE); POLYMER SCIENCE; POST DEPOSITION TREATMENT; PREPARATION CONDITIONS; SPIN-COATED FILMS; SPIN-SPEED; STRUCTURE AND MORPHOLOGY; STRUCTURE AND ORIENTATION; SUBSTRATE FUNCTIONALIZATION; SURFACE INTERACTIONS; UPPER LAYER;

ATOMIC FORCE MICROSCOPY; CARRIER MOBILITY; FIELD EFFECT TRANSISTORS; OPTIMIZATION; SILICON OXIDES; SYNCHROTRON RADIATION; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 84861188116     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eurpolymj.2012.03.019     Document Type: Article

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