Preparation methodologies and nano/microstructural evaluation of metal/semiconductor thin films

Journal of Nanoscience and Nanotechnology

Volumn 12, Issue 1, 2012, Pages 26-59

  Chen, Zhiwen ^a,b   Jiao, Zheng ^a   Wu, Minghong ^a   Shek, Chan Hung ^b   Lawrence Wu, C M ^b   Lai, Joseph K L ^b  

^a SHANGHAI UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Annealing; Fractal; Microstructure; Nanostructure; Preparation; Thin films

Indexed keywords

ANNEALING TEMPERATURES; BI-LAYER FILMS; EXTENDED VERSIONS; INTERDISCIPLINARY RESEARCH; MICRO-ELECTRONIC DEVICES; NANO-STRUCTURED; NANOSCIENCE AND NANOTECHNOLOGIES; PREPARATION; TECHNOLOGICAL APPLICATIONS;

ANNEALING; FRACTALS; GERMANIUM; MAGNETIC FILMS; MICROELECTRONICS; MICROSTRUCTURE; NANOCRYSTALLINE ALLOYS; NANOCRYSTALS; NANOSCIENCE; NANOSTRUCTURES; PALLADIUM; THIN FILMS;

FILM PREPARATION;

METAL; NANOMATERIAL;

ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; METHODOLOGY; PARTICLE SIZE; REVIEW; SEMICONDUCTOR; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MEMBRANES, ARTIFICIAL; METALS; NANOSTRUCTURES; PARTICLE SIZE; SEMICONDUCTORS; SURFACE PROPERTIES;

EID: 84861176202     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2012.5793     Document Type: Conference Paper

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