Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Nano Letters

Volumn 10, Issue 5, 2010, Pages 1582-1588

  Chern, Winston ^a,b   Hsu, Keng ^a,b   Chun, Ik Su ^a,b   Azeredo, Bruno P D ^a,b   Ahmed, Numair ^a,b   Kim, Kyou Hyun ^b   Zuo, Jian Min ^b   Fang, Nick ^a,b   Ferreira, Placid ^a,b   Li, Xiuling ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

Light emitting; Metal assisted chemical etching (MacEtch); S4; Sidewall roughness; Silicon nanowire

Indexed keywords

ETCHING CONDITION; METAL-ASSISTED CHEMICAL ETCHING; PHOTOVOLTAICS; POTENTIAL APPLICATIONS; ROOM TEMPERATURE; S4; SEMICONDUCTOR NANOWIRE; SIDEWALL ROUGHNESS; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; SILVER SURFACE; SUPERIONIC; SURFACE FEATURE; THERMOELECTRICS; TOP-DOWN FABRICATION; VISIBLE AND NEAR INFRARED;

ETCHING; LIGHT EMISSION; METALS; OPTICAL PROPERTIES; SILVER;

NANOWIRES;

NANOMATERIAL; SILICON; SILVER;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; EQUIPMENT; EQUIPMENT DESIGN; ILLUMINATION; INSTRUMENTATION; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SEMICONDUCTOR; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHTING; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SEMICONDUCTORS; SILICON; SILVER; SURFACE PROPERTIES;

EID: 77952399699     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl903841a     Document Type: Article

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