Experimental studies on the mechanism of wet chemical etching of silicon in HF/HNO3 mixtures

Journal of the Electrochemical Society

Volumn 152, Issue 12, 2005, Pages

  Steinert, M ^a   Acker, J ^a   Henssge A ^a   Wetzig, K ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHROMATOGRAPHIC ANALYSIS; CONCENTRATION (PROCESS); DISSOLUTION; NITRATES; REACTION KINETICS; SILICON;

ETCH RATES; WET CHEMICAL ETCHING;

ETCHING;

EID: 30344484270     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2116727     Document Type: Article

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