Pulsed laser deposition of epitaxial ferroelectric Pb(Zr,Ti)O3 films on silicon substrates

Thin Solid Films

Volumn 520, Issue 14, 2012, Pages 4604-4607

  Borowiak, A S ^a   Niu, G ^b   Pillard, V ^c   Agnus, G ^c   Lecoeur, Ph ^c   Albertini, D ^a   Baboux, N ^a   Gautier, B ^a   Vilquin, B ^b  

^a UNIVERSITÉ DE LYON   (France)

^b ECOLE CENTRALE DE LYON   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Ferroelectric oxides; Molecular beam epitaxy; Pb(Zr,Ti)O3; Piezo Force Microscopy; Pulsed laser deposition; Silicon; Thin film

Indexed keywords

BOTTOM ELECTRODES; EPITAXIAL FERROELECTRIC; FERROELECTRIC OXIDES; FERROELECTRIC PROPERTY; HIGH CONTRAST; PB(ZR , TI)O; PIEZOFORCE MICROSCOPY; POLED FERROELECTRICS; PZT; PZT FILM; PZT THIN FILM; QUALITY LAYERS; SI(0 0 1); SILICON SUBSTRATES; SRTIO; TIO;

EPITAXIAL GROWTH; FERROELECTRICITY; LEAD; MANGANESE OXIDE; MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; SILICON; THIN FILMS; ZIRCONIUM;

ELECTRIC PROPERTIES;

EID: 84860315216     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.139     Document Type: Conference Paper

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