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Volumn 520, Issue 14, 2012, Pages 4678-4684

Development of two-step etching approach for aluminium doped zinc oxide using a combination of standard HCl and NH4Cl etch steps

Author keywords

Etching method; NH4Cl; Scattering properties; Silicon thin solar cells; ZnO:Al

Indexed keywords

CL-CONCENTRATIONS; ETCH PROCESS; ETCHING METHOD; LIGHT-TRAPPING; NH4CL; RADIO FREQUENCY SPUTTERING; SCATTERING PROPERTY; SILICON THIN FILM; SURFACE FEATURE; TEXTURED FILMS; ZNO; ZNO:AL FILMS;

EID: 84860286143     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.190     Document Type: Conference Paper
Times cited : (10)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.