Effects of substrate temperature on the efficiency of hydrogen incorporation on the properties of Al-doped ZnO films

Superlattices and Microstructures

Volumn 51, Issue 5, 2012, Pages 644-650

  Zhou, H B ^a   Zhang, H Y ^a   Tan, M L ^b   Wang, Z G ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

AZO thin films; Hydrogen incorporation; RF magnetron sputtering; Substrate temperature

Indexed keywords

AL-DOPED ZNO; AZO FILMS; AZO THIN FILMS; CRYSTALLINITIES; DIFFERENT SUBSTRATES; ELECTRICAL AND OPTICAL PROPERTIES; FOUR-POINT PROBE MEASUREMENTS; GLASS SUBSTRATES; HIGH SUBSTRATE TEMPERATURE; HYDROGEN ATOMS; HYDROGEN INCORPORATION; LOW SUBSTRATE TEMPERATURE; MICRO-STRUCTURAL; RF-MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPE; SUBSTRATE TEMPERATURE; SURFACE PROFILERS; TRANSPARENT CONDUCTING FILMS; TRANSPARENT CONDUCTIVE; XRD PATTERNS;

ALUMINUM; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; HYDROGEN; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

SUBSTRATES;

EID: 84859374086     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2012.03.003     Document Type: Article

References (23)

1. V. Musat, B. Teixeira, E. Fortunato, and R.C.C. Monteiro Thin Solid Films 502 2006 219 222
2. Z.Y. Zhang, C.G. Bao, W.J. Yao, S.Q. Ma, L.L. Zhang, and S.Z. Hou Superlattice. Microstruct. 49 2011 644 653
3. V. Assuncao, E. Fortunato, A. Marques, H. Aguas, I. Ferreira, M.E.V. Costa, and R. Martins Thin Solid Films 427 2003 401 405
4. S. Fujihara, C. Sasaki, and T. Kimura Appl. Surf. Sci. 180 2001 341 350
5. J.F. Chang, W.C. Lin, and M.H. Hon Appl. Surf. Sci. 183 2001 18 25
6. H.L. Hartnagel, A.L. Davar, A.K. Jain, and C. Jagadish Semiconducting Transparent Thin Films 1995 Institute of Physics Publishing London
7. O. Kluth, G. Schöpe, B. Rech, R. Menner, M. Oertel, K. Orgassa, and H.W. Schock Thin Solid Films 502 2005 311 316
8. J. Mass, P. Bhattacharya, and R.S. Katiyar Mater. Sci. Eng. B 103 2003 9 15
9. Y. Kashiwaba, F. Katahira, K. Haga, T. Sekiguchi, and H. Watanabe J. Cryst. Growth 221 2000 431 434
10. A.L. Armelao, F.M. Fabrizio, G.S. Gialanella, and Z.F. Zordan Thin Solid Films 394 2001 90 96
11. H.X. Chen, J.J. Ding, X.G. Zhao, and S.Y. Ma Microstructure and optical properties of ZnO:Al films prepared by radio frequency reactive magnetron sputtering Physica B 405 2010 1339 1344
12. B. Houng, C. Hsi, B. Hou, and S. Fu Effect of process parameters on the growth and properties of impurity-doped zinc oxide transparent conducting thin films by RF magnetron sputtering Vacuum 83 2008 534 539
13. C.G. van de Walle, and J. Neugebauer Nature 423 2003 626 628
14. C.G. van de Walle Phys. Rev. Lett. 85 2000 1012 1015
15. C.G. van de Walle Phys. Status Solidi B 229 2002 221 228
16. C. Kilic, and A. Zunger Appl. Phys. Lett. 81 2002 73 75
17. A. Janotti, and C.G. Van de Walle Nat. Mater. 6 2007 44 47
18. A. Reynolds, D.C. Look, and B. Jogai Solid State Commun. 99 1996 873 875
19. J.H. Lee Curr. Appl. Phys. 10 2010 S515 S519
20. W. Gopel, and U. Lampe Phys. Rev. B 22 1980 6447 6462
21. M.K. Hudiat, P. Modak, and S.B. Krupanidhi Mater. Sci. Eng. B 60 1999 1 11
22. N.Y. Lee, K.J. Lee, C. Lee, J.E. Kim, H.Y. Park, D.H. Kwak, H.C. Lee, and H. Lim J. Appl. Phys. 78 1995 3367 3670
23. L.Y. Chen, W.H. Chen, J.J. Wang, F.C.-N. Hong, and Y.K. Su Appl. Phys. Lett. 85 2004 5628 5630