Microstructure and optical properties of ZnO:Al films prepared by radio frequency reactive magnetron sputtering

Physica B: Condensed Matter

Volumn 405, Issue 5, 2010, Pages 1339-1344

  Chen, H X ^a   Ding, J J ^a   Zhao, X G ^b   Ma, S Y ^a  

^a NORTHWEST NORMAL UNIVERSITY   (China)

^b GANSU UNIVERSITY OF CHINESE MEDICINE   (China)

Author keywords

Optical properties; RF magnetron sputtering; X ray diffraction; ZnO thin films

Indexed keywords

AL-DOPED ZNO; BLUE EMISSION; CRYSTAL QUALITIES; DOPED ZNO; FLUORESCENCE SPECTROPHOTOMETRY; INTENSE BLUE; PHOTOLUMINESCENCE MEASUREMENTS; RADIO FREQUENCIES; REACTIVE MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; ZNO THIN FILM; ZNO THIN FILMS; ZNO:AL FILMS;

ALUMINUM; DIFFRACTION; FILM PREPARATION; LIGHT; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; MICROSTRUCTURE; OPTICAL PROPERTIES; RADIO; RADIO WAVES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

OPTICAL FILMS;

EID: 74849086239     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2009.11.085     Document Type: Article

References (29)

1. Marotti R.E., Giorgi P., Machado G., and Dalchiele E.A. Sol. Energy Mater. Sol. Cells 90 (2006) 2356
2. Shan F.K., Shin B.C., Kim S.C., and Yu Y.S. J. Eur. Ceram. Soc. 24 (2004) 1861
3. Liu Z.F., Shan F.K., Li Y.X., Shin B.C., and Yu Y.S. J. Cryst. Growth 259 (2003) 130
4. Khomchenko V.S., Kryshtab T.G., and Savin A.K. Superlattices Microstruct. 42 (2007) 94
5. Lee H.W., Choi B.G., Shim K.B., and Oh Y.J. J. Ceram. Proc. Res. 6 (2005) 52
6. Vanheusden K., Seager C.H., Warren W.L., Tallant D.R., and Voigt J.A. Appl. Phys. Lett. 68 (1996) 403
7. Lin B., Fu Z., and Jia Y. Appl. Phys. Lett. 79 (2001) 943
8. Xu Z.Q., Deng H., Li Y., Guo Q.H., and Li Y.R. Mater. Res. Bull. 41 (2006) 354
9. Jin H.J., Song M.J., and Park C.B. Physica B 404 (2009) 1097
10. Li L.J., Deng H., Dai L.P., Chen J.J., Yuan Q.L., and Li Y. Mater. Res. Bull. 43 (2008) 1456
11. Yoo Y.Z., Sekiguchi T., et al. Appl. Phys. Lett. 84 (2004) 502
12. Wang Y.G., Lau S.P., Zhang X.H., Hng H.H., et al. J. Appl. Phys. 94 (2003) 354
13. Xue S.W., Zu X.T., Zheng W.G., Chen M.Y., and Xiang X. Physica B 382 (2006) 201
14. Jimenez Gonzalez A.E. J. Solid State Chem. 128 (1997) 176
15. Sanon G., Rup R., and Mansingh A. Thin Solid Films 190 (1989) 287
16. Hong R.J., Qi H.J., Huang J.B., He H.B., Fan Z.X., and Shao J.D. Thin Solid Films 473 (2005) 58
17. Chen Y., Bagnall D.M., Koh H.J., Park K., Hiraga K., Zhu Z., and Yao T. J. Appl. Phys. 84 (1998) 3912
18. Cullity B.D. Elements of X-ray Diffractions (1978), Addison-Wesley, Reading, MA
19. Wang L.W., Meng L.J., Teixeira V., Song S.G., Xu Z., and Xu X.R. Thin Solid Films 517 (2009) 3721
20. Girtan M., and Folcher G. Surf. Coat. Technol. 172 (2003) 242
21. Park S.M., Ikegami T., Ebihara K., and Shin P.K. Appl. Surf. Sci. 253 (2006) 1522
22. Gupta R.K., Ghosh K., Patel R., Mishra S.R., and Kahol P.K. J.Cryst. Growth 310 (2008) 3019
23. Lin B.X., Fu Z.X., and Jia Y.B. Appl. Phys. Lett. 79 (2001) 943
24. Jin B.J., Im S., and Lee S.Y. Thin Solid Films 366 (2000) 107
25. Kohan A.F., Ceder G., and Morgan D. Phys. Rev. B 61 (2000) 15019
26. Yamamoto T., Shiosaki T., and Kawabata A. J. Appl. Phys. 51 (1980) 3113
27. Srikant V., and Clarke D.R. J. Appl. Phys. 81 (1997) 6357
28. Lin S.S., and Huang J.L. Surf. Coat. Technol. 185 (2004) 222
29. Ding J.J., Ma S.Y., Chen H.X., Shi X.F., Zhou T.T., and Mao L.M. Physica B 404 (2009) 2439