SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 86, Issue 10, 2012, Pages 1494-1498

Annealing effect of ZnO/Au/ZnO transparent conductive films

(7) Lee, H M a Lee, Y J a Kim, I S a Kang, M S a Heo, S B a Kim, Y S a Kim, Daeil a

a University of Ulsan (South Korea)

Author keywords

Annealing; Au; Multilayer; Thin film; XRD; ZnO

Indexed keywords

ANNEALING EFFECTS; ANNEALING TEMPERATURES; AU(1 1 1 ); AZO FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; GLASS SUBSTRATES; LARGE AREA DISPLAY; LARGE-AREA ELECTRONICS; LOW RESISTIVITY; OPTICAL AND ELECTRICAL PROPERTIES; PEAK INTENSITY; POST DEPOSITION ANNEALING; POST-DEPOSITION; RADIO FREQUENCIES; TRANSPARENT CONDUCTIVE FILMS; TRANSPARENT ELECTRODE; VACUUM-ANNEALING; XRD; ZNO;

ANNEALING; ELECTRIC PROPERTIES; FILM PREPARATION; GOLD DEPOSITS; MULTILAYERS; OPTICAL PROPERTIES; SUBSTRATES; THIN FILMS; VACUUM; VACUUM APPLICATIONS; VAPOR DEPOSITION; WORK FUNCTION; X RAY DIFFRACTION; ZINC OXIDE;

GOLD;

EID: 84859352603 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2012.02.041 Document Type: Conference Paper

Times cited : (53)

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