Influence of nickel thickness on the properties of ITO/Ni/ITO thin films

Journal of Alloys and Compounds

Volumn 478, Issue 1-2, 2009, Pages 330-333

  Park, J H ^a   Chae, J H ^a   Kim, Daeil ^a  

^a University of Ulsan   (South Korea)

Author keywords

Atomic force microscopy; Optical properties; Thin films; X ray diffraction

Indexed keywords

DIFFRACTION PEAKS; FIGURE OF MERITS; FILM COMPOSITES; ITO FILMS; NI INTERLAYERS; OPTICAL TRANSMITTANCES; OPTOELECTRICAL PROPERTIES; REACTIVE MAGNETRON SPUTTERING; RMS ROUGHNESS; ROOT-MEAN-SQUARE ROUGHNESS; SINGLE LAYERS; XRD;

ATOMIC FORCE MICROSCOPY; ATOMS; COMPOSITE FILMS; DIFFRACTION; FILM PREPARATION; HOLOGRAPHIC INTERFEROMETRY; INSTRUMENT SCALES; MULTILAYER FILMS; NICKEL; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 67349095022     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.11.065     Document Type: Article

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