Evolution of SiH x hydrides during the phase transition from amorphous to nanocrystalline silicon films

Journal of Applied Physics

Volumn 111, Issue 4, 2012, Pages

  Garozzo, C ^a   Puglisi, R A ^a   Bongiorno, C ^a   Spinella, C ^a   Mirabella, S ^a   Reitano, R ^b   Di Marco, S ^c   Foti, M ^c   Lombardo, S ^a  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; BONDING MECHANISM; CHEMICAL CHARACTERIZATION; CRITICAL NUCLEI; CRYSTALLINE GRAINS; CRYSTALLINE PHASE; ELECTRICAL CHARACTERISTIC; EXPERIMENTAL DATA; INTRINSIC LAYER; MORPHOLOGICAL EVOLUTION; NANOCRYSTALLINE PHASE; NANOCRYSTALLINE SILICON FILMS; SI MATRIX; STRUCTURAL CHARACTERISTICS;

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDRIDES; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SILICON;

EID: 84857943479     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3686136     Document Type: Article

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