메뉴 건너뛰기




Volumn 4, Issue 6, 2012, Pages 2101-2108

Precisely-controlled fabrication of single ZnO nanoemitter arrays and their possible application in low energy parallel electron beam exposure

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; ELECTRON BEAM LITHOGRAPHY; PLASMA ETCHING;

EID: 84857834399     PISSN: 20403364     EISSN: 20403372     Source Type: Journal    
DOI: 10.1039/c2nr11636g     Document Type: Article
Times cited : (31)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.