|
Volumn 4, Issue 6, 2012, Pages 2101-2108
|
Precisely-controlled fabrication of single ZnO nanoemitter arrays and their possible application in low energy parallel electron beam exposure
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CHLORINE;
ELECTRON BEAM LITHOGRAPHY;
PLASMA ETCHING;
ELECTRON-BEAM EXPOSURE;
EMITTER ARRAYS;
ENHANCING EFFECT;
HOLE PATTERNS;
LOW ENERGIES;
LOW VOLTAGES;
NANO-EMITTER ARRAYS;
NANOHOLES;
NITROGEN-DOPING;
SURFACE SMOOTHING;
ZNO;
ZINC OXIDE;
NANOMATERIAL;
ZINC OXIDE;
ARTICLE;
CHEMISTRY;
CONFORMATION;
CRYSTALLIZATION;
ELECTRON;
MACROMOLECULE;
MATERIALS TESTING;
METHODOLOGY;
PARTICLE SIZE;
SURFACE PROPERTY;
ULTRASTRUCTURE;
CRYSTALLIZATION;
ELECTRONS;
MACROMOLECULAR SUBSTANCES;
MATERIALS TESTING;
MOLECULAR CONFORMATION;
NANOSTRUCTURES;
PARTICLE SIZE;
SURFACE PROPERTIES;
ZINC OXIDE;
|
EID: 84857834399
PISSN: 20403364
EISSN: 20403372
Source Type: Journal
DOI: 10.1039/c2nr11636g Document Type: Article |
Times cited : (31)
|
References (25)
|