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Volumn 41, Issue 6 B, 2002, Pages
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Nanometer-scale surface modification using scanning tunneling microscope (STM)-based lithography with conductive layer on resist
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Author keywords
E beam lithography; PMMA; Scanning probe microscope; Scanning tunneling microscope
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRON IRRADIATION;
ELECTRON SCATTERING;
OPTICAL RESOLVING POWER;
SCANNING TUNNELING MICROSCOPY;
SURFACE TREATMENT;
HIGH-ENERGY INCIDENT ELECTRON;
SCANNING PROBE MICROSCOPE;
POLYMETHYL METHACRYLATES;
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EID: 0037098548
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.l667 Document Type: Letter |
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Times cited : (4)
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References (2)
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