Dose control circuit for digital electrostatic electron-beam array lithography

Analog Integrated Circuits and Signal Processing

Volumn 48, Issue 2, 2006, Pages 143-150

  Durisety, Chandra Sekhar A ^a   Vijayraghavan, Rajagopal ^a,c   Seshan, Lakshmipriya ^b   Islam, Syed K ^a   Blalock, Benjamin J ^a,c  

^a University of Tennessee   (United States)

^b INTEL CORPORATION   (United States)

^c UNIVERSITY OF TENNESSEE   (United States)

Author keywords

CNF; DCC; Dose control circuit; Integrator; Lithography; Mask less lithography; Photolithography

Indexed keywords

CARBON NANOFIBERS (CNF); DOSE CONTROL CIRCUIT (DCC); INTEGRATOR; MASS LESS LITHOGRAPHY;

DIGITAL CONTROL SYSTEMS; ELECTRON BEAM LITHOGRAPHY; ELECTRON EMISSION; MASKS; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY;

CARBON FIBERS;

EID: 33745132735     PISSN: 09251030     EISSN: 15731979     Source Type: Journal    
DOI: 10.1007/s10470-006-7227-5     Document Type: Article

References (4)

1. L. R. Baylor et al., "Digital electrostatic electron-beam array lithography," Journal of Vacuum Science & Technology B, vol.20, pp. 2646-2650, November 2002.
2. Bolton Eric, "A CMOS microluminometer for use in a bioluminescent bioreporter integrated circuit," Master's Thesis, University of Tennessee, 2001.
3. R. Jacob Baker, Harry W. Li and David E. Boyce, "CMOS Circuit Design, Layout, and Simulation," John Wiley and Sons, New York, 1998.
4. Behzad Razavi, "Design of Analog CMOS Integrated Circuits," McGraw-Hill International Edition, 2001.