Multiplexed blanker array for parallel electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3174-3176

  Winograd, G I ^a   Han, L ^a   McCord, M A ^a   Pease, R F W ^a   Krishnamurthi, V ^b  

^a STANFORD UNIVERSITY   (United States)

^b Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000178724     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590345     Document Type: Article

References (7)

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5. G. Winograd et al., J. Vac. Sci. Technol. B 15, 2289 (1997).
6. H. Yasuda et al., J. Vac. Sci. Technol. B 14 3813 (1996).
7. L Han et al., Emerging Lithographic Technologies II, 23-25 Feb. 1998, Santa Clara, California, Proc. SPIE 3331, 292 (1998).