Inherently reproducible fabrication of plasmonic nanoparticle arrays for SERS by combining nanoimprint and copolymer lithography

ACS Applied Materials and Interfaces

Volumn 3, Issue 4, 2011, Pages 1033-1040

  Krishnamoorthy, Sivashankar ^a   Krishnan, Sathiyamoorthy ^b   Thoniyot, Praveen ^c   Low, Hong Yee ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c AGENCY FOR SCIENCE   (Singapore)

Author keywords

block copolymer; nanodiscs; nanofabrication; nanoimprint lithography; nanorods; plasmonic array; SERS

Indexed keywords

AMPHIPHILIC COPOLYMERS; FABRICATION ROUTES; GALVANIC DISPLACEMENT; GOLD NANOROD; HIGH RESOLUTION; HIGH-PRECISION; HIGH-THROUGHPUT; INTERACTION MODES; LOW COST FABRICATION; NANO-IMPRINT; NANODISCS; NANOFABRICATION; NANOPOROUS POLYMERS; NUMERICAL SIMULATION; PLASMONIC ARRAY; PLASMONIC COUPLING; PLASMONIC NANOPARTICLE ARRAYS; RAMAN PEAK; SERS; SERS SUBSTRATE; SI WAFER; THERMAL-ANNEALING;

BLOCK COPOLYMERS; COPOLYMERIZATION; FABRICATION; MOLDS; NANORODS; PLASMONS; PLASTIC PRODUCTS; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTITUTION REACTIONS; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 84857713540     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am1011518     Document Type: Article

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