-
1
-
-
30644463099
-
Solution-processed zinc oxide field-effect transistors based on self-assembly of colloidal nanorods
-
DOI 10.1021/nl051586w
-
B. Sun and H. Sirringhaus, "Solution-processed zinc oxide field-effect transistors based on self-assembly of colloidal nanorods," Nano Lett., vol. 5, no. 12, pp. 2408-2413, Dec. 2005. (Pubitemid 43088886)
-
(2005)
Nano Letters
, vol.5
, Issue.12
, pp. 2408-2413
-
-
Sun, B.1
Sirringhaus, H.2
-
2
-
-
78149444851
-
2/V · s
-
Nov.
-
2/V · s," Adv. Mater., vol. 22, no. 42, pp. 4764-4769, Nov. 2010.
-
(2010)
Adv. Mater.
, vol.22
, Issue.42
, pp. 4764-4769
-
-
Adamopoulos, G.1
Bashir, A.2
Thomas, S.3
Gillin, W.P.4
Georgakopoulos, S.5
Shkunov, M.6
Baklar, M.A.7
Stingelin, N.8
-
3
-
-
67849106925
-
Aqueous inorganic inks for low-temperature fabrication of ZnO TFTs
-
Dec.
-
S. T. Meyers, J. T. Anderson, C. M. Hung, J. Thompson, J. F. Wager, and D. A. Keszler, "Aqueous inorganic inks for low-temperature fabrication of ZnO TFTs," J. Amer. Chem. Soc., vol. 130, no. 51, pp. 17 603-17 609, Dec. 2008.
-
(2008)
J. Amer. Chem. Soc.
, vol.130
, Issue.51
, pp. 17603-17609
-
-
Meyers, S.T.1
Anderson, J.T.2
Hung, C.M.3
Thompson, J.4
Wager, J.F.5
Keszler, D.A.6
-
4
-
-
33847421302
-
A novel LTPS-TFT pixel circuit compensating for TFT threshold-voltage shift and OLED degradation for AMOLED
-
Feb.
-
C. L. Lin and Y. C. Chen, "A novel LTPS-TFT pixel circuit compensating for TFT threshold-voltage shift and OLED degradation for AMOLED," IEEE Electron Device Lett., vol. 28, no. 2, pp. 129-131, Feb. 2007.
-
(2007)
IEEE Electron Device Lett.
, vol.28
, Issue.2
, pp. 129-131
-
-
Lin, C.L.1
Chen, Y.C.2
-
5
-
-
41749115191
-
Current-scaling a-Si:H TFT pixel-electrode circuit for AM-OLEDs: Electrical properties and stability
-
DOI 10.1109/TED.2007.902665
-
H. Lee, Y. C. Lin, H. P. D. Shieh, and J. Kanicki, "Current-scaling a-Si:H TFT pixel-electrode circuit for AM-OLEDs: Electrical properties and stability," IEEE Trans. Electron Devices, vol. 54, no. 9, pp. 2403-2410, Sep. 2007. (Pubitemid 351485756)
-
(2007)
IEEE Transactions on Electron Devices
, vol.54
, Issue.9
, pp. 2403-2410
-
-
Lee, H.1
Lin, Y.-C.2
Shieh, H.-P.D.3
Kanicki, J.4
-
6
-
-
33645683083
-
Effects of electrical bias stress on the performance ZnO-based TFTs fabricated by RF magnetron sputtering
-
Mar.
-
R. Navamathavan, E. J. Yang, J. H. Lim, D. K. Hwang, J. Y. Oh, J. H. Yang, J. H. Jang, and S. J. Park, "Effects of electrical bias stress on the performance ZnO-based TFTs fabricated by RF magnetron sputtering," J. Electrochem. Soc., vol. 153, no. 5, pp. G385-G388, Mar. 2006.
-
(2006)
J. Electrochem. Soc.
, vol.153
, Issue.5
-
-
Navamathavan, R.1
Yang, E.J.2
Lim, J.H.3
Hwang, D.K.4
Oh, J.Y.5
Yang, J.H.6
Jang, J.H.7
Park, S.J.8
-
7
-
-
54949102088
-
Improving the gate stability of ZnO thin-film transistors with aluminum oxide dielectric layers
-
Oct.
-
M. S. Oh, K. Lee, J. H. Song, B. H. Lee, M. M. Sung, D. K. Hwang, and S. Im, "Improving the gate stability of ZnO thin-film transistors with aluminum oxide dielectric layers," J. Electrochem. Soc., vol. 155, no. 12, pp. H1 009-H1 014, Oct. 2008.
-
(2008)
J. Electrochem. Soc.
, vol.155
, Issue.12
-
-
Oh, M.S.1
Lee, K.2
Song, J.H.3
Lee, B.H.4
Sung, M.M.5
Hwang, D.K.6
Im, S.7
-
8
-
-
73849118524
-
Atomic layer deposition ZnO:N thin film transistor: The effects of N concentration on the device properties
-
S. J. Lim, J. M. Kim, D. Kim, S. Kwon, J. S. Park, and H. Kim, "Atomic layer deposition ZnO:N thin film transistor: The effects of N concentration on the device properties," J. Electrochem. Soc., vol. 157, no. 2, pp. H214- H218, 2010.
-
(2010)
J. Electrochem. Soc.
, vol.157
, Issue.2
-
-
Lim, S.J.1
Kim, J.M.2
Kim, D.3
Kwon, S.4
Park, J.S.5
Kim, H.6
-
9
-
-
73349136977
-
Recent advances in ZnO-based light-emitting diodes
-
Jan.
-
Y. S. Choi, J. W. Kang, D. K. Hwang, and S. J. Park, "Recent advances in ZnO-based light-emitting diodes," IEEE Trans. Electron Devices, vol. 57, no. 1, pp. 26-41, Jan. 2010.
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, Issue.1
, pp. 26-41
-
-
Choi, Y.S.1
Kang, J.W.2
Hwang, D.K.3
Park, S.J.4
-
10
-
-
33846061249
-
Transparent ZnO thin film transistor fabricated by sol-gel and chemical bath deposition combination method
-
Jan.
-
H. C. Cheng, C. F. Chen, and C. Y. Tsay, "Transparent ZnO thin film transistor fabricated by sol-gel and chemical bath deposition combination method," Appl. Phys. Lett., vol. 90, no. 1, p. 012113, Jan. 2007.
-
(2007)
Appl. Phys. Lett.
, vol.90
, Issue.1
, pp. 012113
-
-
Cheng, H.C.1
Chen, C.F.2
Tsay, C.Y.3
-
11
-
-
77951623832
-
Effect of metallic composition on electrical properties of solution-processed indium-gallium-zinc-oxide thin-film transistors
-
May
-
Y. H. Kim, M. K. Han, J. I. Han, and S. K. Park, "Effect of metallic composition on electrical properties of solution-processed indium-gallium-zinc- oxide thin-film transistors," IEEE Trans. Electron Devices, vol. 57, no. 5, pp. 1009-1014, May 2010.
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, Issue.5
, pp. 1009-1014
-
-
Kim, Y.H.1
Han, M.K.2
Han, J.I.3
Park, S.K.4
-
12
-
-
0034891115
-
Effects of Li and Mg doping on microstructure and properties of sol-gel ZnO thin films
-
DOI 10.1016/S0955-2219(01)00182-0, PII S0955221901001820
-
S. Fujihara, C. Sasaki, and T. Kimura, "Effects of Li and Mg doping on microstructure and properties of sol-gel ZnO thin films," J. Eur. Ceram. Soc., vol. 21, no. 10/11, pp. 2109-2112, 2001. (Pubitemid 32764002)
-
(2001)
Journal of the European Ceramic Society
, vol.21
, Issue.10-11
, pp. 2109-2112
-
-
Fujihara, S.1
Sasaki, C.2
Kimura, T.3
-
13
-
-
61549131929
-
Fabrication conditions for solution-processed high-mobility ZnO thin-film transistors
-
C. Li, Y. Li, Y. Wu, B. S. Ong, and R. Loutfy, "Fabrication conditions for solution-processed high-mobility ZnO thin-film transistors," J. Mater., vol. 19, no. 11, pp. 1626-1634, 2009.
-
(2009)
J. Mater.
, vol.19
, Issue.11
, pp. 1626-1634
-
-
Li, C.1
Li, Y.2
Wu, Y.3
Ong, B.S.4
Loutfy, R.5
-
14
-
-
0040523455
-
An electron density residual study of zinc oxide
-
DOI 10.1006/jssc.1996.0095
-
H. Sawada, R. Wang, and A. W. Sleight, "An electron density residual study of zinc oxide," J. Solid State Chem., vol. 122, no. 1, pp. 148-150, Feb. 1996. (Pubitemid 126315790)
-
(1996)
Journal of Solid State Chemistry
, vol.122
, Issue.1
, pp. 148-150
-
-
Sawada, H.1
Wang, R.2
Sleight, A.W.3
-
15
-
-
0037415828
-
ZnO-based transparent thin-film transistors
-
Feb.
-
R. L. Hoffman, B. J. Norris, and J. F. Wager, "ZnO-based transparent thin-film transistors," Appl. Phys. Lett., vol. 82, no. 5, pp. 733-735, Feb. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.82
, Issue.5
, pp. 733-735
-
-
Hoffman, R.L.1
Norris, B.J.2
Wager, J.F.3
-
16
-
-
43749115053
-
-
C. R. Kagan and P. Andry Eds. New York: Marcel Dekker
-
J. Kanicki and S. Martin, Thin-Film Transistors, C. R. Kagan and P. Andry, Eds. New York: Marcel Dekker, 2003, p. 87.
-
(2003)
Thin-Film Transistors
, pp. 87
-
-
Kanicki, J.1
Martin, S.2
-
17
-
-
0034516767
-
Surface characterization of transparent conductive oxide Al-doped ZnO films
-
DOI 10.1016/S0022-0248(00)00834-4
-
M. Chen, Z. L. Pei, C. Sun, L. S. Wen, and X. Wang, "Surface characterization of transparent conductive oxide Al-doped ZnO films," J. Cryst. Growth, vol. 220, no. 3, pp. 254-262, Dec. 2000. (Pubitemid 32034214)
-
(2000)
Journal of Crystal Growth
, vol.220
, Issue.3
, pp. 254-262
-
-
Chen, M.1
Pei, Z.L.2
Sun, C.3
Wen, L.S.4
Wang, X.5
-
18
-
-
78650380659
-
Effect of Zr addition on ZnSnO thin-film transistors using a solution process
-
Dec.
-
Y. S. Rim, D. L. Kim, W. H. Jeong, and H. J. Kim, "Effect of Zr addition on ZnSnO thin-film transistors using a solution process," Appl. Phys. Lett., vol. 97, no. 23, p. 233 502, Dec. 2010.
-
(2010)
Appl. Phys. Lett.
, vol.97
, Issue.23
, pp. 233-502
-
-
Rim, Y.S.1
Kim, D.L.2
Jeong, W.H.3
Kim, H.J.4
-
19
-
-
79953845463
-
1-xO thin film transistors
-
Mar.
-
1-xO thin film transistors," Appl. Phys. Lett., vol. 98, no. 12, p. 123 511, Mar. 2011.
-
(2011)
Appl. Phys. Lett.
, vol.98
, Issue.12
, pp. 123-511
-
-
Ku, C.J.1
Duan, Z.2
Reyes, P.I.3
Lu, Y.4
Xu, Y.5
Hsueh, C.L.6
Garfunkel, E.7
-
20
-
-
51349141239
-
Bias-stress-induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors
-
Sep.
-
J. M. Lee, I. T. Cho, J. H. Lee, and H. I. Kwon, "Bias-stress- induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors," Appl. Phys. Lett., vol. 93, no. 9, p. 093 504, Sep. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.9
, pp. 093-504
-
-
Lee, J.M.1
Cho, I.T.2
Lee, J.H.3
Kwon, H.I.4
|