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Current Applied Physics

Volumn 12, Issue 3, 2012, Pages 940-944

The application of conventional photolithography to microscale organic resistive memory devices

(6) Cho, Byungjin a Nam, Kyu Hyun b Song, Sunghoon a Ji, Yongsung a Jung, Gun Young a Lee, Takhee c

a Gwangju Institute of Science and Technology (GIST) (South Korea)

b LG Chemical Ltd (South Korea)

c Seoul National University (South Korea)

Author keywords

Conventional photolithography; Embedded electrodes; Organic resistive memory

Indexed keywords

ACTIVE LAYER; ARRAY STRUCTURES; BOTTOM ELECTRODES; CONVENTIONAL PHOTOLITHOGRAPHY; DEVELOPING PROCESS; EMBEDDED ELECTRODES; LIFT-OFF PROCESS; MEMORY PERFORMANCE; MICRO-SCALES; OFF CURRENT; ON/OFF RATIO; ORGANIC DEVICES; ORGANIC ELECTRONIC DEVICES; ORGANIC LAYERS; ORGANIC MEMORIES; ORGANIC MEMORY DEVICES; ORGANIC RESISTIVE MEMORY; PATTERNING TECHNIQUES; STATISTICAL MEMORY; UNIPOLAR SWITCHING;

CARRIER TRANSPORT; ELECTRODES; ELECTRON DEVICES; EQUIPMENT;

PHOTOLITHOGRAPHY;

EID: 84857455854 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2011.12.014 Document Type: Article

Times cited : (11)

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