Direct observation of localized conduction pathways in photocross-linkable polymer memory

Journal of Applied Physics

Volumn 105, Issue 12, 2009, Pages

  Kwan, Wei Lek ^a   Lei, Bao ^a   Shao, Yue ^a   Prikhodko, Sergey V ^a   Bodzin, Noah ^b   Yang, Yang ^a  

^a University of California   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE CHARACTERISTICS; DIRECT OBSERVATION; HIGH ELECTRIC FIELDS; LOCALIZED CONDUCTION; METAL INJECTION; NANO SCALE; NON-UNIFORMITIES; PHOTO-CROSS-LINKABLE POLYMERS; RESISTIVE SWITCHING; TEMPERATURE DEPENDENT; TRANSIENT BEHAVIOR; TRANSMISSION ELECTRON MICROSCOPE;

ELECTRIC FIELDS; ION BEAMS; PLASTIC FILMS; POLYMER FILMS; POLYMERS; TRANSMISSION ELECTRON MICROSCOPY;

CONDUCTING POLYMERS;

EID: 67650233607     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3153980     Document Type: Conference Paper

References (38)

1. Emerging Research Devices, International Technology Roadmap for Semiconductors 2007 Edition.
2. K. Galatsis, K. Wang, Y. Yang, Y. H. Xie, J. F. Stoddart, R. B. Kaner, C. Ozkan, J. Liu, M. Ozkan, C. Zhou, and K. W. Kim, IEEE Circuits Devices Mag. 8755-3996 22, 12 (2006). 10.1109/MCD.2006.1657845
3. L. Li, Q. D. Ling, S. L. Lim, Y. P. Tan, C. X. Zhu, D. S. H. Chan, E. T. Kang, and K. G. Neoh, Org. Electron. 1566-1199 8, 401 (2007). 10.1016/j.orgel.2007.02.002
4. H. T. Lin, Z. Pei, J. R. Chen, C. P. Kung, Y. C. Lin, C. M. Tseng, and Y. J. Chan, Tech. Dig.-Int. Electron Devices Meet. 0163-1918, 2007, 233. 10.1109/IEDM.2007.4418910
5. B. Cho, T. Yasue, H. Yonn, M. Lee, I. Yeo, U. Chung, J. Moon, and B. Ryu, Tech. Dig.-Int. Electron Devices Meet. 0163-1918 2006, 781. 10.1109/IEDM.2006.346729
6. W. L. Kwan, R. J. Tseng, W. Wu, Q. Pei, and Y. Yang, Tech. Dig.-Int. Electron Devices Meet. 0163-1918 2007, 237. 10.1109/IEDM.2007.4418911
7. W. L. Kwan, R. J. Tseng, and Y. Yang, Philos. Trans. R. Soc. London, Ser. A 0962-8428 (in press).
8. J. C. Scott and L. D. Bozano, Adv. Mater. (Weinheim, Ger.) 0935-9648 19, 1452 (2007). 10.1002/adma.200602564
9. Q. D. Ling, D. J. Liaw, C. Zhu, D. S. H. Chan, E. T. Kang, and K. G. Neoh, Prog. Polym. Sci. 0079-6700 33, 917 (2008). 10.1016/j.progpolymsci.2008. 08.001
10. L. P. Ma, J. Liu, and Y. Yang, Appl. Phys. Lett. 0003-6951 80, 2997 (2002). 10.1063/1.1473234
11. J. Ouyang, C. W. Chu, C. R. Szmanda, L. P. Ma, and Y. Yang, Nature Mater. 1476-1122 3, 918 (2004). 10.1038/nmat1269
12. R. J. Tseng, J. Huang, J. Ouyang, R. B. Kaner, and Y. Yang, Nano Lett. 1530-6984 5, 1077 (2005). 10.1021/nl050587l
13. C. W. Chu, J. Ouyang, R. J. Tseng, and Y. Yang, Adv. Mater. (Weinheim, Ger.) 0935-9648 17, 1440 (2005). 10.1002/adma.200500225
14. L. D. Bozano, B. W. Kean, V. R. Deline, J. R. Salem, and J. C. Scott, Appl. Phys. Lett. 0003-6951 84, 607 (2004). 10.1063/1.1643547
15. L. Bozano, B. Kean, M. Beinhoff, K. Carter, P. Rice, and J. C. Scott, Adv. Funct. Mater. 1616-301X 15, 1933 (2005). 10.1002/adfm.200500130
16. S. H. Kang, T. Crisp, I. Kymissis, and V. Bulović, Appl. Phys. Lett. 0003-6951 85, 4666 (2004). 10.1063/1.1819991
17. S. Paul, A. Kanwal, and M. Chhowalla, Nanotechnology 0957-4484 17, 145 (2006). 10.1088/0957-4484/17/1/023
18. D. I. Son, J. H. Kim, D. H. Park, W. K. Choi, F. Li, J. H. Ham, and T. W. Kim, Nanotechnology 0957-4484 19, 055204 (2008). 10.1088/0957-4484/19/05/055204
19. M. Cölle, M. Büchela, and D. M. de Leeuw, Org. Electron. 1566-1199 7, 305 (2006). 10.1016/j.orgel.2006.03.014
20. F. Verbakel, S. C. J. Meskers, R. A. J. Janssen, H. L. Gomes, M. Cölle, M. Büchel, and D. M. de Leeuw, Appl. Phys. Lett. 0003-6951 91, 192103 (2007). 10.1063/1.2806275
21. G. Dearnaley, D. V. Morgan, and A. M. Stoneham, J. Non-Cryst. Solids 0022-3093 4, 593 (1970). 10.1016/0022-3093(70)90097-9
22. D. Tondelier, K. Lmimouni, D. Vuillaume, C. Fery, and G. Haas, Appl. Phys. Lett. 0003-6951 85, 5763 (2004). 10.1063/1.1829166
23. L. F. Pender and R. J. Fleming, J. Appl. Phys. 0021-8979 46, 3426 (1975). 10.1063/1.322063
24. J. Tyczkowski, Thin Solid Films 0040-6090 199, 335 (1991). 10.1016/0040-6090(91)90015-P
25. S. L. Lim, Q. Ling, E. Y. H. Teo, C. X. Zhu, D. S. H. Chan, E. T. Kang, and K. G. Neoh, Chem. Mater. 0897-4756 19, 5148 (2007). 10.1021/cm071520x
26. F. L. E. Jakobsson, X. Crispin, M. Cölle, M. Büchel, D. M. de Leeuw, and M. Berggren, Org. Electron. 1566-1199 8, 559 (2007). 10.1016/j.orgel.2007.04.002
27. W. J. Joo, T. L. Choi, and K. H. Lee, Thin Solid Films 0040-6090 516, 3133 (2008). 10.1016/j.tsf.2007.08.116
28. S. Berleb, W. Bütting, and M. Schwoerer, Synth. Met. 0379-6779 102, 1034 (1999). 10.1016/S0379-6779(98)00210-0
29. J. Kim, S. Cho, S. Choi, S. Baek, D. Lee, O. Kim, S. M. Park, and M. Ree, Langmuir 0743-7463 23, 9024 (2007). 10.1021/la700785h
30. M. L. Wang, J. Zhou, X. D. Gao, B. F. Ding, Z. Shi, X. Y. Sun, X. M. Ding, and X. Y. Hou, Appl. Phys. Lett. 0003-6951 91, 143511 (2007). 10.1063/1.2794434
31. R. Waser and M. Aono, Nature Mater. 1476-1122 6, 833 (2007). 10.1038/nmat2023
32. A. Sawa, Mater. Today 1369-7021 11, 28 (2008). 10.1016/S1369-7021(08) 70119-6
33. H. Pagnia and N. Sotnik, Phys. Status Solidi A 0031-8965 108, 11 (1988). 10.1002/pssa.2211080102
34. Y. Hirose and H. Hirose, J. Appl. Phys. 0021-8979 47, 2767 (1976). 10.1063/1.322942
35. Y. Naitoh, M. Horikawa, H. Abe, and T. Shimizu, Nanotechnology 0957-4484 17, 5669 (2006). 10.1088/0957-4484/17/22/022
36. M. Saji and K. C. Kao, J. Non-Cryst. Solids 0022-3093 22, 223 (1976). 10.1016/0022-3093(76)90022-3
37. G. S. Park, X. S. Li, D. C. Kim, R. J. Jung, M. J. Lee, and S. Seo, Appl. Phys. Lett. 0003-6951 91, 222103 (2007). 10.1063/1.2813617
38. W. Tang, H. Z. Shi, G. Xu, B. S. Ong, Z. D. Popovic, J. C. Deng, J. Zhao, and G. H. Rao, Adv. Mater. (Weinheim, Ger.) 0935-9648 17, 2307 (2005). 10.1002/adma.200500232