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Volumn 106, Issue 27, 2002, Pages 6921-6929

Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2. XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts

(6) Espinos J P a Morales, J a Barranco, A a Caballero, A a Holgado, J P a Gonzalez Elipe A R a

a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACE EFFECTS; OXIDIZING TREATMENT; SURFACE ANALYTICAL TECHNIQUES; VALENCE STATE;

AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; COPPER; COPPER OXIDES; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC DENSITY OF STATES; EVAPORATION; OXIDATION; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

INTERFACES (MATERIALS);

EID: 0037063108 PISSN: 10895647 EISSN: None Source Type: Journal
DOI: 10.1021/jp014618m Document Type: Article

Times cited : (561)

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