The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system

Vacuum

Volumn 81, Issue 3, 2006, Pages 221-225

  Liu, F ^a   Ren, C S ^a   Wang, Y N ^a   Qi, X L ^a   Ma, T C ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Ar; Cu; DC magnetron sputtering; OES; RF plasma

Indexed keywords

ARGON; COPPER; HYSTERESIS; INDUCTIVELY COUPLED PLASMA; IONIZATION;

DC MAGNETRON SPUTTERING; DISCHARGE PARAMETERS; RF PLASMAS; RF POWER;

MAGNETRON SPUTTERING;

EID: 33749078298     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.03.006     Document Type: Article

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