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Volumn , Issue , 2010, Pages
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Wafer scale fabrication of carbon nanotube FETs with embedded poly-gates
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON NANOTUBE FET;
CARBON NANOTUBE FIELD-EFFECT TRANSISTORS;
CHANNEL MATERIALS;
CMOS PROCESSS;
CRITICAL FACTORS;
FERMI LEVEL PINNING;
GATE DOPING;
GATE WORK FUNCTION;
HIGH DENSITY;
POLY-SI;
POLY-SI GATES;
POST-SILICON;
PROCESS COMPATIBILITY;
PRODUCTION TOOLS;
SUBTHRESHOLD SLOPE;
WAFER SCALE FABRICATION;
WAFER-SCALE INTEGRATION;
CMOS INTEGRATED CIRCUITS;
ELECTRON DEVICES;
FIELD EFFECT TRANSISTORS;
LOGIC DEVICES;
SILICON WAFERS;
CARBON NANOTUBES;
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EID: 79951841993
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IEDM.2010.5703326 Document Type: Conference Paper |
Times cited : (8)
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References (6)
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