SCOPUS 정보 검색 플랫폼

Volumn 520, Issue 7, 2012, Pages 2846-2854

Effects of post-deposition heat treatment on the microstructure and properties of Al-doped ZnO thin films prepared by aqueous phase deposition

(4) Yao, Pin Chuan a Hang, Shih Tse b Wu, Menq Jiun b Hsiao, Wen Tse c

a DA YEH UNIVERSITY (Taiwan)

b NATIONAL CHANGHUA UNIVERSITY OF EDUCATION (Taiwan)

c INSTRUMENT TECHNOLOGY RESEARCH CENTER (Taiwan)

Author keywords

Hydrogen; Liquid phase deposition; Optical properties; Thin films; Water; Zinc oxides

Indexed keywords

AL-DOPED ZNO; ALUMINUM-DOPED ZNO; AQUEOUS PHASE; ATOMIC FORCE MICROGRAPHS; AZO FILMS; BONDING STATE; CHEMISORBED OXYGEN; CRYSTALLINITIES; DOPING CONCENTRATION; ELECTRICAL CONDUCTIVITY; ELECTRICAL RESISTIVITY; ELEVATED TEMPERATURE; GLASS SUBSTRATES; GRAIN BOUNDARY SCATTERING; GRAIN SIZE; HEAT TREATMENT TEMPERATURE; INERT ATMOSPHERES; LIQUID PHASE DEPOSITION; LIQUID PHASE DEPOSITION METHOD; LOW MOBILITY; MEAN FREE PATH; MICROSTRUCTURE AND PROPERTIES; OPTICAL TRANSPARENCY; POLYCRYSTALLINE FILM; POROUS STRUCTURES; POSTDEPOSITION HEAT TREATMENT; PREFERENTIAL ORIENTATION; REDUCING ATMOSPHERE; SCANNING ELECTRON MICROGRAPHS; SCATTERING MECHANISMS; WATER BASED; X RAY PHOTOELECTRON SPECTRA; ZNO;

ALUMINA; ALUMINUM COATINGS; CHEMISORPTION; CONDUCTIVE FILMS; DEPOSITION; ELECTRIC CONDUCTIVITY; FILM PREPARATION; GRAIN BOUNDARIES; GRAIN GROWTH; HEAT TREATMENT; HYDROGEN; LIQUIDS; METALLIC FILMS; OPTICAL PROPERTIES; OXYGEN; OXYGEN VACANCIES; PHOTOELECTRON SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SCATTERING; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; WATER; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

OPTICAL FILMS;

EID: 84856366105 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.11.045 Document Type: Article

Times cited : (10)

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