Influence of deposition parameters on hard Cr-Al-N coatings deposited by multi-arc ion plating

Applied Surface Science

Volumn 258, Issue 8, 2012, Pages 3629-3636

  Wang, Lei ^a   Zhang, Shihong ^a   Chen, Zhong ^a   Li, Jinlong ^a   Li, Mingxi ^a  

^a ANHUI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Bias voltage; Cr Al N films; Multi arc ion plating; Nitrogen partial pressure

Indexed keywords

ADHESION; ALUMINUM COATINGS; ALUMINUM NITRIDE; BIAS VOLTAGE; BOND STRENGTH (MATERIALS); DEPOSITION RATES; HARD COATINGS; HARDNESS; III-V SEMICONDUCTORS; ION IMPLANTATION; IONS; NITROGEN; PARTIAL PRESSURE; PHASE STRUCTURE;

COATING PROPERTIES; CR-AL-N FILMS; DEPOSITION PARAMETERS; MULTIARC ION PLATING; NITROGEN PARTIAL PRESSURES; RESIDUAL COMPRESSIVE STRESS; SOLID SOLUTION PHASE; SUBSTRATE BIAS VOLTAGES;

NITROGEN COMPOUNDS;

EID: 84856225532     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.11.127     Document Type: Article

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