Influence of substrate bias voltage on structure and properties of Cr-Mo-Si-N coatings prepared by a hybrid coating system

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 624-627

  Hong, Seung Gyun ^a   Kwon, Se Hun ^b   Kang, Sang Won ^b   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Arc ion plating; Cr Mo Si N; Magnetron sputtering; Substrate bias voltage

Indexed keywords

BIAS VOLTAGE; CAVITY RESONATORS; CHROMIUM; COATINGS; GRAIN SIZE AND SHAPE; ION IMPLANTATION; MAGNETRON SPUTTERING; MAGNETRONS; MICROCRYSTALLINE SILICON; MICROHARDNESS; MOLYBDENUM; PLATING; RANGE FINDING; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SUBSTRATES; SURFACE TOPOGRAPHY;

ARC ION PLATING; ARC ION PLATINGS; CR-MO-SI-N; FILM MICROSTRUCTURES; GRAIN SIZES; HYBRID COATINGS; INTERNAL STRESSES; N COATINGS; RESPUTTERING; SI WAFERS; STRUCTURE AND PROPERTIES; SUBSTRATE BIAS VOLTAGE; SUBSTRATE BIAS VOLTAGES; XRD SPECTRUMS;

CHROMATE COATINGS;

EID: 55749098304     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.125     Document Type: Article

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