Effects of superimposed pulse bias on TiN coating in cathodic arc deposition

Surface and Coatings Technology

Volumn 131, Issue 1-3, 2000, Pages 158-161

  Zhengyang, Li ^a   Wubiao, Zhu ^a   Yong, Zhang ^a   Guiying, Li ^a   Eryan, Cao ^a  

^a INSTITUTE OF MECHANICS   (China)

Author keywords

Cathodic arc; Orthogonal design; Pulse bias

Indexed keywords

CATHODIC ARC PLASMA DEPOSITION; COATING; DESIGN; TITANIUM NITRIDE; WEAR RESISTANCE;

EID: 0034532617     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00754-4     Document Type: Article

References (15)

1. Ion flux characteristics in arc vapor deposition of TiN