Efficient prototyping of large-scale pdms and silicon nanofluidic devices using pdms-based phase-shift lithography

Microfluidics and Nanofluidics

Volumn 12, Issue 1-4, 2012, Pages 465-473

  Viero, Y ^a,b   He, Q ^a,b   Mazenq, L ^a,b   Ranchon, H ^a,b   Fourniols, J Y ^a,b   Bancaud, A ^a,b  

^a LAAS CNRS   (France)

^b UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANOMALOUS RESPONSE; CONVENTIONAL PHOTOLITHOGRAPHY; NANO CHANNELS; NANO-FLUIDIC DEVICES; NANOFLUIDIC SYSTEMS; NON-SPECIFIC INTERACTIONS; PH CONDITION; POLYDIMETHYLSILOXANE PDMS; SINGLE DNA MOLECULES; SLOW MIGRATION;

DNA; MICROCHANNELS; PHASE SHIFT; PHOTOLITHOGRAPHY;

NANOFLUIDICS;

EID: 84856212975     PISSN: 16134982     EISSN: 16134990     Source Type: Journal    
DOI: 10.1007/s10404-011-0888-0     Document Type: Article

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