Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers

Nanotechnology

Volumn 14, Issue 1, 2003, Pages 91-94

  Hesjedal, T ^a   Seidel, W ^a  

^a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; MASKS; PHASE SHIFT; PHOTOLITHOGRAPHY;

NEAR FIELD PHASE SHIFT TECHNIQUE; PHASE SHIFTING MASKS; SURFACE ACOUSTIC WAVE TRANSDUCERS;

ACOUSTIC TRANSDUCERS;

EID: 0037253851     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/14/1/320     Document Type: Article

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