Effect of surface morphology on the sputtering yields. I. Ion sputtering from self-affine surfaces

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 222, Issue 3-4, 2004, Pages 316-334

  Makeev, Maxim A ^a,b   Barabási, Albert László ^a  

^a UNIVERSITY OF NOTRE DAME   (United States)

^b University of Southern California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; IONS; MATHEMATICAL MODELS; MORPHOLOGY; PARAMETER ESTIMATION; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

NON-PLANAR SURFACES; SELF-AFFINE SURFACES; SPUTTERING YIELDS;

SPUTTERING;

EID: 19244371997     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.02.027     Document Type: Article

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