Sputter-depth profiling for thin-film analysis

Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences

Volumn 362, Issue 1814, 2004, Pages 55-75

  Hofmann, S ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Depth profiling; Diffusion; Preferential sputtering; Sputtering; Thin films

Indexed keywords

EID: 0346671338     PISSN: 1364503X     EISSN: None     Source Type: Journal    
DOI: 10.1098/rsta.2003.1304     Document Type: Review

References (91)

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