Growth mode transition of atomic layer deposited Al 2O 3 on porous TiO 2 electrodes of dye-sensitized solar cells

Thin Solid Films

Volumn 520, Issue 6, 2012, Pages 1745-1750

  Tien, Ta Chang ^a   Pan, Fu Ming ^a   Wang, Lih Ping ^b   Tsai, Feng Yu ^c   Lin, Ching ^c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Atomic layer deposition (ALD); Core shell nanoparticle; Dye sensitized solar cells; Growth mode

Indexed keywords

ANATASE NANOPARTICLES; ATOMIC LAYER DEPOSITED; CORE/SHELL NANOPARTICLES; DYE-SENSITIZED SOLAR CELL; ELECTRODE LAYERS; GROWTH BEHAVIOR; GROWTH MODE; GROWTH MODES; GROWTH-MODE TRANSITION; ISLAND GROWTH; LATTICE STRAIN; LAYER-BY-LAYER GROWTH; OVERLAYERS; POROUS TIO; REACTION CYCLES; RUTILE PARTICLES; TIO;

ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; ELECTRODES; NANOPARTICLES; OXIDE MINERALS; PHOTOELECTROCHEMICAL CELLS; SOLAR CELLS;

TITANIUM DIOXIDE;

EID: 84855961481     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.057     Document Type: Article

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