Investigation of molybdenum doped ZnO thin films prepared by spray pyrolysis technique

Ferroelectrics

Volumn 423, Issue 1, 2011, Pages 126-134

  Gokulakrishnan, V ^a   Parthiban, S ^a   Jeganathan, K ^a   Ramamurthi, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

Author keywords

Optical properties; Semiconductor; Structural properties; Thin films

Indexed keywords

ATOMIC FORCE; CORNING GLASS; DOPED ZINC OXIDE THIN FILMS; DOPED ZNO; HEXAGONAL CRYSTAL STRUCTURE; IN-VACUUM; MICROSCOPIC STUDY; MOLYBDENUM DOPING; OPTICAL BAND GAP ENERGY; SEMICONDUCTOR; SPRAY-PYROLYSIS TECHNIQUES; STRUCTURAL AND OPTICAL PROPERTIES; VISIBLE REGION; ZINC OXIDE THIN FILMS; ZNO;

CARRIER CONCENTRATION; CRYSTAL STRUCTURE; METALLIC FILMS; MOLYBDENUM; MOLYBDENUM OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; SEMICONDUCTOR DOPING; STRUCTURAL PROPERTIES; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

SPRAY PYROLYSIS;

EID: 84855802126     PISSN: 00150193     EISSN: 15635112     Source Type: Journal    
DOI: 10.1080/00150193.2011.620898     Document Type: Article

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