Preparation of undoped and indium doped ZnO thin films by pulsed laser deposition method

Crystal Research and Technology

Volumn 40, Issue 12, 2005, Pages 1118-1123

  Kotlyarchuk, B ^a   Savchuk, V ^a   Oszwaldowski, M ^b  

^a PIDSTRYHACH INSTITUTE FOR APPLIED PROBLEMS OF MECHANICS AND MATHEMATICS   (Ukraine)

^b POZNAN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Pulsed laser deposition; Thin films; ZnO

Indexed keywords

ANNEALING; CHEMICAL MODIFICATION; DOPING (ADDITIVES); FILM GROWTH; PULSED LASER DEPOSITION; SUBSTRATES; ZINC OXIDE;

DEPOSITION PARAMETERS; OPTICAL PARAMETERS; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 29044444823     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/crat.200410502     Document Type: Article

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